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QTECH NANOSYSTEMS PTE LTD
Quantum Leaps in Nano World and Beyond
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NANOLITHOGRAPHY 

Nanolithography using Nanopositioning
Photolithography (Optical, UV, EUV)
E –Beam / Ion Beam Lithography

X – Ray Lithography

Interference Lithography
 
Scanning Probe 

 Nano-imprint
 
Shadow Mask

TECHNOLOGY
Every semiconductor chip, mass produced in the world today is manufactured using lithography. Lithography, the technology of patterning, has enabled semiconductor devices to progressively shrink since the inception of integrated circuits more than three decades ago. Throughout the 1980s and 1990s, the trend of miniaturization continued unabated and even accelerated. Current semiconductor devices are being mass produced with 35-nm dense features; by 2008 these devices will have from 30-nm to sub 25 nm dense features. Lithography has been, and will remain for the foreseeable future, the critical technology that makes this trend possible. Nanopositioning technology is a “driving force” for Lithography.  The needs of Lithography technologies are different from Scanning Applications. High flexibility and stability are key requirements. Accuracy of positioning and linearity are very important parameter here. Most of the lithography need X, Y & THETA Z type of positioner.


QTECH'S TECHNOLOGICAL SOLUTIONS

Mechanical Stage: Monolithic Compound Flexures with Amplifier stages

Actuator: Solid stage actuators; Linear & rotory solid state motors can be integrated for long range

Driver: Programmable with control systems based power drive

Sensor: Capacitive, Eddy or Tunneling Sensor for feedback loop
 

Software: custom made software. Additional facility to integrate with instruments is present for data retrieval.

APPLICATION SEGMENTS OF NANOLITHOGRAPHY
Nanotechnology
Biotechnology, Life Sciences, Medicine
Material Science (Smart & Nanomaterials)
Semiconductor
Electronics

SPECIFICAIONS